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Simultaneous measurement of up to 24 elements, from Al(13) to U(92), XDV-μ LD: S(16)-U(92)
Advanced polycapillary optics that focuses the X-ray beam down to 10 μm (FWHM) for measuring on microstructures
Programmable XY stage and pattern recognition for automatic measurements on multiple samples
Extending sample stage for easy positioning of the sample
Guided calibration process
Robust design for long-term use
Optical microscope (270x magnification) with video, laser pointer to show the exact measuring spot
Fundamental parameter analysis for measurements without calibration
Complies with IPC-4552A, 4553B, 4554 and 4556, ASTM B568, ISO 3497
Fischer's certified standards are traceable to internationally recognized base units
Applications
Au/Pd/Ni/CuFe and Sn/Ni coatings in the micro- and nanometer range
Assembled and unassembled circuit boards
Testing of base metallization layers (under-bump metallization, UBM) in the nanometer range
Measurement of light elements, e.g. determination of the phosphorus content (in ENEIG/ENEPIG) under Au and Pd
Lead-free solder caps on copper pillars
Testing the elemental composition of C4 and smaller solder bumps, as well as small contact surfaces in the semiconductor industry
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